Nickel Sputtering Target
Sputtering Targets
Nickel Sputtering Target
Target Diameter
Thickness
Custom dimensions, material grade, purity and tolerances are available on request.
Nickel target for research and thin-film deposition, available in standard and custom dimensions.
Nickel sputtering targets for physical vapour deposition and magnetron sputtering workflows. Select a standard diameter and thickness, or request a specification tailored to your deposition system.
Material grade, purity, tolerances, surface finish and other technical requirements are confirmed during quotation.
| Atomic mass | 58.6934 g/mol |
|---|---|
| Cas number | 7440-02-0 |
| Chemical Formula | Ni |
| Morphology | Solid sputtering target |
| Purity | > 99% |
| Target Diameter | 1 inch (25.4 mm) |
| Thickness | 1 mm |
| SKU | SPT-NI |
- Physical vapour deposition and magnetron sputtering
- Magnetic and conductive films
- Diffusion-barrier layers
- Electrode and catalyst-layer research
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